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Vacuum Deposition And Magnetron Sputtering – A Few Advantages To Consider

By Author: Dan Hamilton
Total Articles: 3

In the process of vacuum deposition, a group of processes takes place. It is used for depositing the layers of the material atom-by-atom or molecule-by-molecule on a solid surface. The definition is in accordance with the giant Wikipedia.

The pressure in the process is used below the atmospheric pressure and that is therefore, vacuum. Multiple layers of unlike materials can be used, for example to create optical coatings.

Some of the very popular and well-known things about the process are:

• This is used for the purpose of reducing the particle density and this makes sure that the mean free path for collision is long.


• This will also help in the reduction of the particle density of undesirable atoms and molecules.


• This will make sure about a low pressure plasma environment.


• It will provide a medium for controlling the gas and vapor composition


• With the process of vacuum deposition Mass flow control into the processing chamber is also controlled.

Condensing particles can be produced in a number of manners and they are:

• Thermal evaporation, Evaporation
• Sputtering
• Cathodic arc vaporization
• laser ablation
• Chemical vapor deposition

There are a number of advantages that are associated with this process and some of them are really very useful for many of our needs. Here is a list of a few but very important advantages of this process and they are:

• With the process of vacuum deposition from the high-purity source material all the High-purity films will be deposited.

• This process is considered to be the least expensive PVD process today.

• If you go for conducting the process then Deposition rate monitoring and control are very easy to manage.

• The source of material, which is to be vaporized, may be a solid in any form and purity.

Magnetron Sputtering Technology

This is another popular and very good form of the PVD coating technology today. This is considered to be a very highly developed process which is employed for the coating of any product with high quality. You can easily categorize this method as one of the most followed in all over the world. Another very popular thing about this process is the higher level of adhesion which is very much capable of providing quality results on various objects. This is one of the most trusted methods and almost any kind of product may it be a compound, element, solid objects or alloy can be easily coated with this process.

Magnetron sputtering technology is also the most flexible and a highly practiced method in the coating industry today. It is capable of offering a number of advantages to the users. There are a number of things that are not much familiar to the users but this process continues to help in the development of highly quality products with the best coating services. Some of the very popular characteristics of the technology are:

• A very little radiation heat is generated.
• Almost any martial can be sputtered.
• Non-conductive materials can be sputtered by using radio frequency.
• Excellent layer uniformity is achieved.
• Very smooth sputtered coatings can be done.
• Oxide coatings can be sputtered.

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